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Beam and Plasma Ion Beam Source L-400

Product details
Maximum Linear Current Density:25 mA/cmBeam width:370 mm
Gas efficiency:9mA/sccmWarranty:other
Maximum current:1000 mApayment terms:wire transfer
Ion energy:500..2500 eVplace of origin; place of origin:Moscow, Russian Federation
Certification:+Beam shape:hollow rectangle
Beam Thickness:22 mmmodel:IBS-L400-01
Maximum beam angle:2port:fort san perret
brand:Beam and Plasma
Product Description

Ion Beam Source L400

Gas discharge ion source for generating linear ion beams. Working principle - anode layer ion beam source. The high uniformity of ion flux distribution along the ion source makes it the best choice for processing substrates on drums or turntables.
process:
- sputtering materials from dielectric and conductive targets;
- Magnetron sputtering assist;
- Ion cleaning, etching;
- polishing;
- Plasma Enhanced Chemical Vapor Deposition (PECVD);
- Surface modification.

detailed image
Packaging and Delivery
processing time
4-6 weeks
port
St. Petersburg
our company

Vacuum Technology Laboratory


Vacuum Technology Laboratories (Trademark: Beams & Plasmas™) is an advanced, fast-growing company from Silicon Valley, Russia. LVT is a manufacturer of vacuum coating equipment. High reliability and high performance, reasonable and affordable are our advantages.

LVT enables:
- 3 NIKA devices (NIKA-2012, -2013, -2014)
- Process equipment range: magnetrons, ion beam sources, plasma generators, sensors and accessories
LVT provides:
- Engineering and Consulting
- Maintenance and repair of vacuum equipment
- Modernization of existing equipment.

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